快速成膜,抗环境氧化Rapid formation of protective coat, anti-nmental oxidation 易去除,无残留污染Easy to remove, no residual
成分 Ingredient |
有机酸、缓蚀剂、掩蔽剂、水Oganic acid, inhibiter and chelant |
工作温度Operating Temperature |
20-35°C |
添加量Proportion |
1-2% |
特点 Feature |
无残留,适用任何精密制程No residue, suitable for any precision process |
包装 Packing |
20L/桶 20L/PD |